Text Size

MEMS Design Software, MEMS Design Tools | Tanner EDA

Reduce your Re-Spins! Shrink Time-to-Market!

MEMS_device1

 

Tanner EDA combines our 24 years of industry experience in EDA tools and MEMS design & fabrication to provide MEMS design tools that are unparalleled in price-performance, functionality, and ease of use. You can read about how leading firms including Knowles Electronics, MEMSIC, and Hymite have used Tanner EDA's L-Edit MEMS to effectively and efficiently design and manufacture innovative products.

 

Read about how Tanner's MEMS tools are driving innovation for these leading firms:

Knowles hymite_logo MEMSIC

 Click here to view a webinar replay that demonstrates L-Edit MEMS Design

L-Edit Provides Significant Advantages to Mechanical Design Tools

 

Mechanical Tool -
No Layer Visualization
Tanner L-Edit -
Layer Visualization

Mechanical_Tool_MEMSsm

Tanner_L_edit_MEMSsm

 

 

DAC_Booth_MEMS_Graphic_sm

Design Rule Checking (DRC) catches design errors BEFORE manufacturing

  • Save on external foundry costs per run -  Don't risk having to pay for materials and services more than once
  •  
  • Save on internal labor costs - Keep the wheels in motion and focus resources onto the next project by not having to revisit errors and invest a second time on redesign, production coordination, and management
  •  
  • Don't delay time to market - Production rescheduling and the manufacturing process will postpone turnaround and ROI
  •  

Automation speeds up the design process

  • Enhanced Boolean operations eliminate manual steps
  • Parameterized cell capabilities automate changes
  • Hierarchical structure speeds operations
  • Ability to write macros in C allows customizable automation

Usability allows designers to jump right in and work faster and easier

  • Complete layer visualization allows viewing of overlapping polygons, curves, and other geometries
  • Boolean operations ease mechanical reliefs and DRIE curved etch patterns while maintaining the actual design geometries on separate layers

 

Tanner EDA MEMS tools: Built for Innovation

Tanner_MEMS_graphic_v01medium

Tanner offers two packages for MEMS designers; L-Edit MEMS and L-Edit MEMS Design. Both tools are built off of our acclaimed L-Edit layout editor and offer advanced features and functionality that is tailored to the unique requirements of MEMS designers.

L-Edit MEMS Design provides the same capabilities and functionality of our L-Edit MEMS package – and adds our Standard DRC tool for those designers requiring design rule checking.

Tanner EDA also offers advanced MEMS design tools in conjunction with our partner SoftMEMS.  The MEMS Pro tool suite from SoftMEMS is built on Tanner L-Edit MEMS and provides advanced features and capabilities for modeling and analysis.

MEMS Modeler – automatically generates behavioral models ready for system simulation with electronics and packaging from 3Ddata from finite element analysis programs. Complex, finite element models involving a large number of degrees of freedom are reduced tobehavioral models with a few master degrees of freedom. Users can also create their own models from analytical equations andthe tool generates simulation-ready descriptions in a variety of popular formats. MEMS Modeler facilitates the bridge between 3D and system simulations enabling design teams to work together.

MEMS_model_2mems_model

The 3D Solid Modeler creates a 3D view of a MEMS device from a selected layout area and fabrication process description. An easy to use Technology Manager allows users to enter fabrication process steps and sequences as well as material properties.  Surface and bulk micromachining process steps such as material deposit, etch, mechanical polish, diffusion, growth, electroplating and wafer manipulation steps are supported. The 3D model may be scaled, and a subset of mask layers may be selected for view. Models can be viewed with rotations, zooms, preset views, step-by-step display of the fabrication sequence, and can be animated to show process sequences.. The Cross Section Viewer displays a cutaway view in the z-dimension based on a user-specified cut line.Boundary conditions may be defined on mask layout and can be automatically transferred along with either a 2D or 3D model to third party analysis or viewing programs in popular formats (e.g. SAT, APDL and IGES).  Models may be “defeatured” for efficient FEM meshing.  A MEMS-specific mesher creates efficient meshes for analysis.3D-To-Layout converts 3D solid models in ANSYS into 2D mask layouts using user-specified fabrication process descriptions, enabling capture of device mask modifications made in 3D analysis programs.

Click here to hear a replay of a Tanner EDA-SoftMEMS Webinar discussing the MEMS-IC Co-Design topic, where these tools are discussed and demonstrated.

To schedule your free 30-day evaluation of these tools, please click here

Login Form